Ce Qin

Title: Innovations of Inventor Ce Qin

Introduction

Ce Qin is a notable inventor based in Fremont, California, with a remarkable portfolio of eight patents. His work primarily focuses on advancements in semiconductor technology, showcasing his expertise in the field.

Latest Patents

Among his latest patents is the "Semiconductor mask reshaping using a sacrificial layer." This invention provides methods and related apparatus for mask reconstruction during an etch process. The techniques involve depositing a sacrificial layer on the mask layer, which protects portions of the mask during reshaping by inhibiting etching or deposition on the mask layer. After the mask reshaping, the sacrificial layer can be removed using the same etch process applied to the target material. Another significant patent is the "Silicon oxide silicon nitride stack stair step etch." This method outlines the formation of a stair-step structure in a stack on a substrate through a series of stair step cycles, which include trimming the mask and etching the stack in multiple cycles.

Career Highlights

Ce Qin has contributed to the semiconductor industry through his work at prominent companies such as Lam Research Corporation and Mattson Technology, Inc. His experience in these organizations has allowed him to develop innovative solutions that enhance semiconductor manufacturing processes.

Collaborations

Ce Qin has collaborated with notable colleagues, including Qian Fu and Zhongkui Tan, who have contributed to his projects and innovations in the field.

Conclusion

Ce Qin's contributions to semiconductor technology through his patents and career achievements highlight his significant impact on the industry. His innovative approaches continue to shape advancements in semiconductor manufacturing processes.