The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2017
Filed:
Sep. 03, 2015
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2005.12); H01L 21/302 (2005.12); H01L 21/3213 (2005.12); H01L 21/311 (2005.12); H01L 21/02 (2005.12); H01L 27/11556 (2016.12); H01L 27/11551 (2016.12);
U.S. Cl.
CPC ...
H01L 21/32139 (2012.12); H01L 21/31144 (2012.12); H01L 21/02164 (2012.12); H01L 21/02274 (2012.12); H01L 21/31116 (2012.12); H01L 27/11551 (2012.12); H01L 27/11556 (2012.12);
Abstract
A method for forming a stair-step structure in a substrate is provided. An organic mask is formed over the substrate. A hardmask with a top layer and sidewall layer is formed over the organic mask. The sidewall layer of the hard mask is removed while leaving the top layer of the hardmask. The organic mask is trimmed. The hardmask is removed. The substrate is etched. The forming the hardmask, removing the sidewall layer, trimming the organic mask, and etching the substrate are repeated a plurality of times.