The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Jan. 27, 2016
Lam Research Corporation, Fremont, CA (US);
Hua Xiang, Pleasanton, CA (US);
Indeog Bae, San Ramon, CA (US);
Sung Jin Jung, San Ramon, CA (US);
Ce Qin, Fremont, CA (US);
Qian Fu, Pleasanton, CA (US);
Yoko Yamaguchi, Union City, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for forming a stair-step structure in a substrate is provided, wherein the substrate has an organic mask, comprising at least one cycle, wherein each cycle comprises a) depositing a hardmask over the organic mask, b) trimming the organic mask, c) etching the substrate, d) trimming the organic mask, wherein there is no depositing a hardmask between etching the substrate and trimming the organic mask, e) etching the substrate, and f) repeating steps a-e a plurality of times forming the stair-step structure.