C C Hsue

Title: C C Hsue: Innovator in Semiconductor Technology

Introduction

C C Hsue is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His innovative methods have advanced the fabrication processes used in modern electronics.

Latest Patents

One of his latest patents is a method of fabricating local interconnects. This method involves providing a semiconductor and forming an isolation structure, a transistor, and a conductive layer on the substrate. A dielectric layer with an opening is created over the substrate, and part of this layer is removed through a photolithography and etching process to form a via opening. This exposes a part of the gate of the transistor or a part of the conductive layer. A conformal barrier layer is then formed in the via opening, which overflows the dielectric layer. Finally, a conductive plug is created in the via opening, and the barrier layer is patterned to establish a local interconnect. Another notable patent is a method of field implantation, which utilizes a photo-resist layer as a mask to implant ions into a substrate, forming a selectively distributed ion field.

Career Highlights

C C Hsue has worked with notable companies in the semiconductor industry, including United Microelectronics Corporation. His work has been instrumental in developing advanced technologies that enhance the performance and efficiency of semiconductor devices.

Collaborations

Throughout his career, C C Hsue has collaborated with esteemed colleagues such as Sun-Chieh Chien and Tony Lin. These partnerships have fostered innovation and contributed to the success of various projects in the semiconductor field.

Conclusion

C C Hsue's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced electronic devices.