San Diego, CA, United States of America

Bruno M La Fontaine

This inventor holds 20 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in Lithography Technology. Top assignees: Asml Netherlands B.v., Advanced Micro Devices Corporation, Dupont Photomasks, Inc.. Active years: 2003-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bruno M La Fontaine. Retrieved from https://idiyas.com/inventor/bruno-m-la-fontaine

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 80.0


Average Co-Inventor Count = 3.0

ph-index = 6

Forward Citations = 120(Granted Patents)


Location History:

  • San Diego, CA (US) (2017 - 2019)
  • Pleasanton, CA (US) (2003 - 2023)

Company Filing History:


Years Active: 2003-2026

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Areas of Expertise:
EUV Lithography
Pattern Fidelity Control
Defect Prediction
Optical Element Protection
Pulsed Voltage Contrast
Reflective Mask
Spacer Lithography
Inspection Systems
Phase Grating
Transport Systems
20 patents (USPTO):Explore Patents

Certainly! Here is an article about inventor Bruno M La Fontaine:

Title: Bruno M La Fontaine: Pioneering Innovations in the World of Technology

Introduction:

Bruno M La Fontaine is a visionary inventor whose passion for innovation and relentless pursuit of excellence have established him as a prominent figure in the world of inventions. With a background in technology and a creative mindset, he continues to inspire the next generation of inventors and shape the future of technology.

Latest Patents:

Bruno La Fontaine holds an impressive number of 18 patents, with two of his latest patents making significant strides in the field of technology:

1. Prediction of out of specification based on a spatial characteristic of process variability - This patent introduces a method for determining a probabilistic model to predict characteristics of patterns on a substrate subjected to a patterning process.

2. Method and apparatus for pattern fidelity control - This patent focuses on a method of topography determination, revolutionizing the way focus values are derived in substrate measurements.

Career Highlights:

Having worked in esteemed companies such as Advanced Micro Devices Corporation and ASML Netherlands B.V., Bruno La Fontaine has honed his skills and expertise in the field of technology. His innovative approaches and problem-solving abilities have led to groundbreaking inventions that have reshaped the industry.

Collaborations:

Throughout his career, Bruno La Fontaine has collaborated with talented individuals such as Harry Jay Levinson and Jongwook Kye. Together, they have worked on projects that push the boundaries of technological advancements and drive innovation forward.

Conclusion:

In conclusion, Bruno M La Fontaine's dedication to innovation and his remarkable contributions to the world of technology have solidified his legacy as a trailblazer in the field of inventions. His innovative spirit continues to inspire and motivate inventors worldwide, setting the stage for a future filled with groundbreaking advancements and technological marvels.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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