The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Oct. 04, 2012
Applicant:
Cymer Inc., San Diego, CA (US);
Inventors:
Alexander I. Ershov, Escondido, CA (US);
Norbert R. Bowering, Bielefeld, DE;
Bruno M. La Fontaine, San Diego, CA (US);
Silvia De Dea, San Diego, CA (US);
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70958 (2013.01); G02B 5/0891 (2013.01); G03F 7/70983 (2013.01);
Abstract
Optical element protection systems for protecting optical elements and particularly reflective optical elements from degradation of their optical properties in harsh environments such as the environment inside a vacuum chamber of an EUV light source. The systems include the uses of combinations of materials in various layers where the materials are chosen and the layers are configured and arranged to extend the lifetime of the optical element without compromising its optical properties.