The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Feb. 04, 2003
Harry Levinson, Saratoga, CA (US);
Bruno LA Fontaine, Pleasanton, CA (US);
Harry Levinson, Saratoga, CA (US);
Bruno La Fontaine, Pleasanton, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A methodology for forming a reflective mask is disclosed. The mask facilitates accurate pattern transfers as a substantially defect free reflective coating is formed therein. The mask can generally be formed according to four main steps, for example, which include depositing a reflective coating (e.g., formed of multiple layers) over a substrate, patterning and then inspecting for defects a masking material formed over the reflective coating, correcting such defects and finally patterning the reflective coating with the patterned masking material serving as a guide.