Fremont, CA, United States of America

Brett E Huff


Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 56(Granted Patents)


Company Filing History:


Years Active: 1995-2004

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8 patents (USPTO):Explore Patents

Title: Brett E Huff: Innovator in Electron Emission Technologies

Introduction

Brett E Huff is a prominent inventor based in Fremont, CA, known for his significant contributions to the field of electron emission technologies. With a total of 8 patents to his name, he has made remarkable advancements that have implications in various technological applications.

Latest Patents

Among his latest patents is a groundbreaking design for structures and simplified methods for forming field emission microtip electron emitters. This patent discloses electron emission structures that utilize standard semiconductor processes on a substrate prepared with topographical features. The process involves concurrently depositing at least one layer of a first material on the substrate, which is then etched to create an atomically sharp feature. Following this, at least one layer of a second material is deposited over the sharp feature, and a conductive layer is added. The final steps include removing selected areas of material to expose the sharp feature and providing electrical connectivity to the elements of the electron emission structure.

Another notable patent focuses on optimizing an ILD argon sputter process. This patent describes a sputter etch system and method that includes an etch chamber with a wafer pedestal designed to support a wafer. A magnet is configured to provide a continuous magnetic field directed at the top surface of the wafer pedestal, enhancing the efficiency of the sputter etch process.

Career Highlights

Brett E Huff is currently employed at Intel Corporation, where he continues to innovate and develop new technologies. His work at Intel has positioned him as a key player in advancing semiconductor technologies and electron emission systems.

Collaborations

Throughout his career, Brett has collaborated with notable colleagues, including Farhad K Moghadam and Michael A Maxim. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Brett E Huff's contributions to electron emission technologies and his innovative patents reflect his expertise and dedication to advancing the field. His work at Intel Corporation and collaborations with esteemed colleagues further highlight his impact on technology and innovation.

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