Biao Liu

Title: Innovations by Biao Liu in Wafer Treatment Technologies

Introduction

Biao Liu is a prominent inventor based in San Jose, California, known for his significant contributions to the field of wafer treatment technologies. With a total of nine patents to his name, Liu has made remarkable advancements in methods for achieving defect-free self-assembled monolayers.

Latest Patents

Among his latest patents, Liu has developed innovative methods for depositing films selectively onto different materials. One notable patent describes a process where a substrate is pre-cleaned by heating it to a specific temperature, which helps in cleaning contaminants and activating the surface. This process promotes the formation of a self-assembled monolayer (SAM) on the first material. The SAM is created through repeated cycles of exposure, heating, and reactivation. A final exposure to SAM molecules is performed before selectively depositing a film on the second material. Additionally, Liu has patented methods for enhancing selectivity in SAM-based selective depositions, which involve forming a SAM on a second surface and a carbonized layer on the first surface.

Career Highlights

Biao Liu is currently employed at Applied Materials, Inc., where he continues to push the boundaries of innovation in semiconductor manufacturing technologies. His work has been instrumental in improving the efficiency and effectiveness of wafer treatment processes.

Collaborations

Throughout his career, Liu has collaborated with talented individuals such as Cheng Pan and Chang Ke.