The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2013

Filed:

Dec. 13, 2012
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Biao Liu, San Jose, CA (US);

Chikuang Wang, San Jose, CA (US);

Yuri Uritsky, Newark, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 7/00 (2006.01);
U.S. Cl.
CPC ...
G21K 7/00 (2013.01);
Abstract

A method of operation of a measurement system includes: providing a specimen having a film; controlling a beam generator to direct a charged particle beam into the specimen; detecting a reference signal emitted from the specimen; normalizing the reference signal to create a film L-ratio; and determining a thickness of the film by correlating the film L-ratio to a calibration curve.


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