Foster City, CA, United States of America

Yuri S Uritsky

USPTO Granted Patents = 14 

Average Co-Inventor Count = 2.6

ph-index = 8

Forward Citations = 293(Granted Patents)


Location History:

  • Foster City, CA (US) (1993 - 1997)
  • Newark, CA (US) (1996 - 2013)

Company Filing History:


Years Active: 1993-2013

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14 patents (USPTO):Explore Patents

Sure, here is the article about inventor Yuri S Uritsky:

Title: Innovator Spotlight: Yuri S Uritsky

Introduction:

Yuri S Uritsky is a prolific inventor based in Foster City, CA with an impressive portfolio of 14 patents to his name. His groundbreaking work in the field of measurement systems and dynamic mode AFM curve acquisition has earned him recognition in the industry.

Latest Patents:

1. Measurement system with thickness calculation and method of operation thereof: This patent showcases Yuri's expertise in developing a method for determining film thickness using a charged particle beam and calibration curve correlation.

2. Non-destructive ambient dynamic mode AFM amplitude versus distance curve acquisition: This patent highlights Yuri's innovation in dynamic mode AFM curve acquisition by enabling a constant force feedback mechanism for precise tip-to-sample distance determination.

Career Highlights:

Yuri S Uritsky is a key contributor at Applied Materials, Inc., a leading technology company in the semiconductor industry. His role in pioneering new measurement techniques and curve acquisition methods has significantly advanced the company's research and development efforts.

Collaborations:

Yuri has collaborated with esteemed professionals in his field, including Patrick D Kinney and Chikuang Charles Wang. Together, they have worked on cutting-edge projects that have pushed the boundaries of innovation in the industry.

Conclusion:

Inventor Yuri S Uritsky's dedication to pushing the limits of technological innovation is evident in his impressive patent portfolio and collaborative efforts with industry experts. His contributions continue to make a significant impact in the field of measurement systems and dynamic curve acquisition, setting new standards for the industry.

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