The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Mar. 10, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Chang Ke, Sunnyvale, CA (US);
Michael S. Jackson, Sunnyvale, CA (US);
Liqi Wu, San Jose, CA (US);
Lei Zhou, San Jose, CA (US);
Shuyi Zhang, San Jose, CA (US);
David Thompson, San Jose, CA (US);
Paul F. Ma, Scottsdale, AZ (US);
Biao Liu, San Jose, CA (US);
Cheng Pan, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods of improved selectively for SAM-based selective depositions are described. Some of the methods include forming a SAM on a second surface and a carbonized layer on the first surface. The substrate is exposed to an oxygenating agent to remove the carbonized layer from the first surface, and a film is deposited on the first surface over the protected second surface. Some of the methods include overdosing a SAM molecule to form a SAM layer and SAM agglomerates, depositing a film, removing the agglomerates, reforming the SAM layer and redepositing the film.