Shuyi Zhang

Title: Innovations of Shuyi Zhang in Selective Deposition Technologies

Introduction

Shuyi Zhang is an accomplished inventor based in San Jose, CA. She has made significant contributions to the field of selective deposition technologies, holding 2 patents that enhance the efficiency and effectiveness of these methods. Her work is particularly relevant in the semiconductor industry, where precision and selectivity are paramount.

Latest Patents

Shuyi Zhang's latest patents focus on methods for enhancing selectivity in self-assembled monolayer (SAM)-based selective deposition. These patents describe innovative techniques that include forming a SAM on a second surface while creating a carbonized layer on the first surface. The substrate is then exposed to an oxygenating agent to remove the carbonized layer from the first surface, allowing for a film to be deposited on the first surface over the protected second surface. Additionally, her methods involve overdosing a SAM molecule to form a SAM layer and SAM agglomerates, followed by depositing a film, removing the agglomerates, reforming the SAM layer, and redepositing the film. These advancements represent a significant step forward in the field of selective deposition.

Career Highlights

Shuyi Zhang is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment industry. Her role involves developing and refining technologies that improve the performance and reliability of semiconductor devices. Her expertise and innovative approaches have positioned her as a key player in her field.

Collaborations

Shuyi has collaborated with notable colleagues, including Chang Ke and Michael Sterling Jackson. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Shuyi Zhang's contributions to selective deposition technologies exemplify her innovative spirit and dedication to advancing the semiconductor industry. Her patents not only enhance the selectivity of deposition methods but also pave the way for future advancements in the field.