Applied Materials, Inc.

Shuyi Zhang

David P Thompson

Paul F Ma

Lei Zhou

Liqi Wu

Michael Sterling Jackson

Chang Ke

Cheng Pan

Biao Liu

Methods of improved selectively for SAM-based selective depositions are described. Some of the methods include forming a SAM on a second surface and a carbonized layer on the first surface. The substrate is exposed to an oxygenating agent to remove the carbonized layer from the first surface, and a film is deposited on the first surface over the protected second surface. Some of the methods include overdosing a SAM molecule to form a SAM layer and SAM agglomerates, depositing a film, removing the agglomerates, reforming the SAM layer and redepositing the film.

Methods for enhancing selectivity in SAM-based selective deposition

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San Jose, CA, United States of America

Shuyi Zhang