The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2020
Filed:
Jun. 14, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Chang Ke, Sunnyvale, CA (US);
Lei Zhou, San Jose, CA (US);
Biao Liu, San Jose, CA (US);
Cheng Pan, San Jose, CA (US);
Yuanhong Guo, San Jose, CA (US);
Liqi Wu, San Jose, CA (US);
Michael S. Jackson, Sunnyvale, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Tobin Kaufman-Osborn, Sunnyvale, CA (US);
Erica Chen, Cupertino, CA (US);
Paul F. Ma, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.