Bei Shi

Title: Innovations by Inventor Bei Shi

Introduction

Bei Shi is an accomplished inventor based in Goleta, California. He has made significant contributions to the field of photodetector technology. His innovative work focuses on developing methods and devices that enhance the performance of photodetector circuits.

Latest Patents

Bei Shi holds a patent for a "Method and device for photodetector circuit with near infrared compliant substrate." This invention involves a photodetector circuit utilizing a near infrared (NIR) compliant substrate. The substrate features a plurality of v-grooves formed within a front region, along with a first GaAs buffer region, a defect filter layer (DFL), and a second GaAs buffer region. The device can also incorporate an overlying wavelength configuring material with a graded region containing multiple material regions arranged by concentration. This configuration is designed for a selected wavelength. The photodetector device materials can be structured in an array of photomultiplier (PM) devices or single photon avalanche detector (SPAD) devices.

Career Highlights

Bei Shi is currently employed at Aeluma, Inc., where he continues to push the boundaries of photodetector technology. His work has garnered attention for its innovative approach and practical applications in various fields.

Collaborations

Bei has collaborated with notable colleagues, including Jonathan Klamkin and Simone Suran Brunelli, who contribute to the dynamic research environment at Aeluma, Inc.

Conclusion

In summary, Bei Shi is a pioneering inventor whose work in photodetector technology is shaping the future of this field. His patent and ongoing contributions reflect his commitment to innovation and excellence.