Company Filing History:

30 out of 37,972

Micron Technology Incorporated

patents

4 out of 3,777

Lam Research Corporation

patents

where one patent can have more than one assignee

Years Active: 2008-2025

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36 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12463044 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2025-11-04),

2. 11935756 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2024-03-19),

3. 11335563 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2022-05-17),

4. 10784086 - Cobalt etch back (2020-09-22),

5. 10607844 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2020-03-31),

6. 10096483 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2018-10-09),

7. 9870899 - Cobalt etch back (2018-01-16),

8. 9761457 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2017-09-12),

9. 9679781 - Methods for integrated circuit fabrication with protective coating for planarization (2017-06-13),

10. 9589853 - Method of planarizing an upper surface of a semiconductor substrate in a plasma etch chamber (2017-03-07),

11. 9570320 - Method to etch copper barrier film (2017-02-14),

12. 9330934 - Methods of forming patterns on substrates (2016-05-03),

13. 9305782 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2016-04-05),

14. 9184159 - Simplified pitch doubling process flow (2015-11-10),

15. 9003651 - Methods for integrated circuit fabrication with protective coating for planarization (2015-04-14),

Title: Innovations of Baosuo Zhou in Semiconductor Technology

Introduction

Baosuo Zhou is a prominent inventor based in Boise, ID, recognized for his significant contributions to the semiconductor industry. With an impressive portfolio of 35 patents, he has played a vital role in advancing technologies that enhance semiconductor devices and electronic systems.

Latest Patents

Among his latest innovations is the patent for "Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same." This inventive method is designed to improve the density of features formed over an initial patterning layer through a series of self-aligned spacers. The process involves providing a layer to be etched, forming an initial sacrificial patterning layer, which can be created via optical lithography. Once the patterning layer is trimmed, a series of spacer layers are then formed and etched, where the number of layers and their dimensions are tailored according to the desired increase in feature density. This approach is essential for the ongoing development of more efficient in-process semiconductor devices and electronic systems.

Career Highlights

Baosuo Zhou has made substantial advancements in his career by working at leading companies such as Micron Technology and Lam Research Corporation. His expertise in semiconductor technology and patterning methods has significantly impacted device miniaturization and performance.

Collaborations

During his career, Baosuo Zhou has collaborated with notable professionals in the field, including Ardavan Niroomand and Mirzafer K Abatchev. These collaborations have fostered innovative ideas and have contributed to the successful execution of complex semiconductor projects.

Conclusion

Baosuo Zhou's innovative spirit and dedication to enhancing semiconductor technology continue to influence the industry significantly. With a growing number of patents and a strong career trajectory, he remains a pivotal figure in the evolution of semiconductor devices and their applications in modern electronics.

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