The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Nov. 28, 2017
Lam Research Corporation, Fremont, CA (US);
Jialing Yang, Fremont, CA (US);
Baosuo Zhou, Redwood, CA (US);
Meihua Shen, Fremont, CA (US);
Thorsten Lill, Santa Clara, CA (US);
John Hoang, Fremont, CA (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
Methods of etching cobalt on substrates are provided. Some methods involve exposing the substrate to a boron-containing halide gas and an additive, and exposing the substrate to an activation gas and a plasma. Additives improve selectively depositing a thicker layer of a boron-containing halide material on a surface of a mask than on a surface of a metal. Additives include H, CH, CF, NF, and Cl. Boron-containing halide gases include BCl, BBr, BF, and BI. Exposures may be performed in two or more cycles, with variations in durations and/or bias power for each exposure in the two or more cycles.