Company Filing History:

13 out of 2,714

Bell Telephone Laboratories

patents

3 out of 3,345

At&t Bell Laboratories

patents

2 out of 745

American Telephone & Telegraph Co., At&t Bell Laboratories

patents

Years Active: 1976-1994

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18 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 5356659 - Metallization for semiconductor devices (1994-10-18),

2. 4985373 - Multiple insulating layer for two-level interconnected metallization in (1991-01-15),

3. 4851370 - Fabricating a semiconductor device with low defect density oxide (1989-07-25),

4. 4675715 - Semiconductor integrated circuit vertical geometry impedance element (1987-06-23),

5. 4589928 - Method of making semiconductor integrated circuits having backside (1986-05-20),

6. 4438450 - Solid state device with conductors having chain-shaped grain structure (1984-03-20),

7. 4378628 - Cobalt silicide metallization for semiconductor integrated circuits (1983-04-05),

8. 4364779 - Fabrication of semiconductor devices including double annealing steps (1982-12-21),

9. 4332839 - Method for making integrated semiconductor circuit structure with (1982-06-01),

10. 4276557 - Integrated semiconductor circuit structure and method for making it (1981-06-30),

11. 4240196 - Fabrication of two-level polysilicon devices (1980-12-23),

12. 4171489 - Radiation mask structure (1979-10-16),

13. 4151007 - Hydrogen annealing process for stabilizing metal-oxide-semiconductor (1979-04-24),

14. 4142004 - Method of coating semiconductor substrates (1979-02-27),

15. 4062747 - Native growth of semiconductor oxide layers (1977-12-13),

Title: **Innovative Contributions of Ashok K Sinha in Semiconductor Technology**

Introduction

Ashok K Sinha is a distinguished inventor based in New Providence, NJ, known for his significant contributions to semiconductor technology. With a remarkable portfolio of 18 patents, he has pioneered several innovations that have advanced the field significantly. His work primarily focuses on metallization processes and insulation methods essential for enhancing the performance of semiconductor devices.

Latest Patents

Among his latest patents, Ashok K Sinha has developed innovative techniques instrumental in the fabrication of semiconductor devices. One such patent introduces a low-temperature chemical vapor deposition process utilized to encapsulate aluminum conductors on silicon substrates, forming bimetallic conductors with refractory tungsten material. Another notable invention involves a multilayer insulation method for semiconductor integrated circuit structures, which includes a plasma planarized silicon dioxide layer, enhancing the insulation between first and second levels of aluminum metallization.

Career Highlights

Sinha has had a noteworthy career with prominent institutions. He has worked with Bell Telephone Laboratories and AT&T Bell Laboratories, where he contributed to cutting-edge research and development projects. His inventions not only demonstrate his technical proficiency but also reflect his commitment to innovation within the semiconductor industry.

Collaborations

Throughout his career, Ashok has collaborated with esteemed colleagues, notably Hyman J Levinstein and Shyam P Murarka. These collaborations have not only helped refine his inventions but have also significantly impacted the advancement of semiconductor technologies through shared expertise and innovative thinking.

Conclusion

Ashok K Sinha's extensive patent portfolio and collaborative efforts underline his role as a pivotal figure in semiconductor innovation. His commitment to advancing technology continues to influence the industry, providing valuable insights and techniques that shape the future of semiconductor manufacturing.

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