The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 1979

Filed:

Sep. 13, 1978
Applicant:
Inventors:

Arthur C Adams, Berkeley Heights, NJ (US);

Cesar D Capio, Fords, NJ (US);

Hyman J Levinstein, Berkeley Heights, NJ (US);

Ashok K Sinha, New Providence, NJ (US);

David N Wang, Warren Township, Somerset County, NJ (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G21F / ;
U.S. Cl.
CPC ...
250510 ; 250482 ;
Abstract

The discovery that boron nitride and boron carbide films can be made in tension allows nondistorting radiation windows or masks to be realized. Both low and high pressure techniques for making the tensile films lead to related mask structures utilizing such films. The resulting structures are sufficiently distortion free to be useful for x-ray lithography.


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