San Jose, CA, United States of America

Arkaprava Dan

USPTO Granted Patents = 12 

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2023)
  • San Jose, CA (US) (2022 - 2024)

Company Filing History:


Years Active: 2022-2025

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Innovator Spotlight: Arkaprava Dan

Introduction: Arkaprava Dan, a distinguished inventor based in San Jose, CA, has made significant contributions to the field of substrate processing and material deposition. With a remarkable portfolio of nine patents, he has demonstrated a commitment to innovation that has greatly impacted his industry.

Latest Patents: Among his latest inventions are two notable patents. The first is titled "Dithering or dynamic offsets for improved uniformity," which describes an apparatus and methods for processing substrates. This invention features a circular arrangement of process stations around a rotational axis, along with a support assembly that allows for dynamic positioning of the substrates in relation to the stations. This design aims to enhance the uniformity of processes performed on substrates.

The second patent, "PEALD titanium nitride with direct microwave plasma," dispenses a novel method for depositing titanium nitride through a process known as Plasma-Enhanced Atomic Layer Deposition (PEALD). This method employs direct microwave plasma, which is characterized by high plasma density and low ion energy, improving the overall efficiency of the deposition process and ensuring high-quality results.

Career Highlights: Arkaprava is currently employed at Applied Materials, Inc., a leader in the field of materials engineering. His work there focuses on advancing technologies that enhance the processing capabilities and efficiencies of various substrates. His expertise in substrate processing and material deposition has made him a key asset to the company.

Collaborations: Throughout his career, Arkaprava has collaborated with other notable professionals in the field, including his coworkers Sanjeev Baluja and Joseph F AuBuchon. These collaborations have further enriched his innovation landscape and fostered a spirit of teamwork that leads to groundbreaking advancements.

Conclusion: Arkaprava Dan’s journey as an inventor is marked by his dedication to pushing the boundaries of technology in substrate processing. With his innovative patents and successful collaborations at Applied Materials, Inc., he continues to pave the way for advancements in the field, showcasing the powerful impact of creativity and engineering in modern applications.

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