The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Aug. 11, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Hanhong Chen, Milpitas, CA (US);
Arkaprava Dan, San Jose, CA (US);
Joseph AuBuchon, San Jose, CA (US);
Kyoung Ha Kim, Cupertino, CA (US);
Philip A. Kraus, San Jose, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); H01J 37/32 (2006.01); C23C 16/34 (2006.01); H01L 21/768 (2006.01); C23C 16/511 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32201 (2013.01); C23C 16/34 (2013.01); C23C 16/511 (2013.01); H01L 21/28568 (2013.01); H01L 21/76841 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A method of depositing titanium nitride is disclosed. Some embodiments of the disclosure provide a PEALD process for depositing titanium nitride which utilizes a direct microwave plasma. In some embodiments, the direct microwave plasma has a high plasma density and low ion energy. In some embodiments, the plasma is generated directly above the substrate surface.