Anatoly Burov

Title: Innovations of Anatoly Burov in EUV Lithography

Introduction

Anatoly Burov is a prominent inventor based in Austin, TX (US), known for his significant contributions to the field of EUV lithography. With a total of 5 patents to his name, Burov has developed innovative methods that enhance the calibration, prediction, and control of stochastic defects in lithographic processes.

Latest Patents

Burov's latest patents focus on a method to calibrate, predict, and control stochastic defects in EUV lithography. The first patent describes a process where an initial probability of occurrence of a stochastic defect over an inspection area of a workpiece is received. All locations of the stochastic defects are sorted by the initial probability of occurrence. A cumulative expected defect count is determined, and this count is normalized to be a fraction of the total expected defect count. Additionally, a number of defect locations is determined to capture potential stochastic defects above a threshold of total stochastic defects. The second patent elaborates on imaging one or more defects within the inspection area using an optical tool or an electron beam tool. A probability of occurrence of a stochastic defect at each of the defect locations is generated using a model. The defect locations are then grouped into probability bins, allowing for a consistency check between the initial probability and observed results, enabling model tuning based on this consistency.

Career Highlights

Anatoly Burov has made a significant impact in the field of lithography through his innovative approaches. His work at Kla Corporation has positioned him as a key player in advancing technologies that address the challenges of stochastic defects in EUV lithography.

Collaborations

Burov collaborates with notable colleagues such as John S Graves and Guy Parsey, contributing to a dynamic environment of innovation and research.

Conclusion

Anatoly Burov's contributions to EUV lithography through his patents and collaborative efforts highlight his role as a leading inventor in the field. His innovative methods continue to shape the future of lithographic technology.