The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Aug. 08, 2023
Kla Corporation, Milpitas, CA (US);
Pradeep Vukkadala, Santa Clara, CA (US);
Guy Parsey, Ann Arbor, MI (US);
Kunlun Bai, Campbell, CA (US);
Xiaohan Li, Ann Arbor, MI (US);
Anatoly Burov, Austin, TX (US);
Cao Zhang, Ann Arbor, MI (US);
John S. Graves, Austin, TX (US);
John Biafore, Milpitas, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A system for mask design repair may develop a simulation-based model of a layer thickness after one or more process steps for fabricating features on a sample, develop a transformed model of the fabrication process that emulates the simulation-based model and has a faster evaluation speed than the simulation-based model, and where the inputs to the transformed model include the input mask design, and where the outputs of the transformed model include one or more output parameters associated with fabrication of the input mask design as well as one or more sensitivity metrics describing sensitivities of the one or more output parameters to variations of the input mask design. The system may further receive a candidate mask design and generate a repaired mask design based on the transformed model and the candidate mask design.