The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Jun. 02, 2021
Kla Corporation, Milpitas, CA (US);
Anatoly Burov, Austin, TX (US);
Guy Parsey, Ann Arbor, MI (US);
Kunlun Bai, Campbell, CA (US);
Pradeep Vukkadala, Santa Clara, CA (US);
Cao Zhang, Ann Arbor, MI (US);
John S. Graves, Austin, TX (US);
Xiaohan Li, Ann Arbor, MI (US);
Craig Higgins, Cedar Park, TX (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A mask pattern for a semiconductor device can be used as an input to determine a photoresist thickness probability distribution using a machine learning module. For example, the machine learning module can determine a probability map of Z-height. This can be used to determine stochastic variation in photoresist thickness for a semiconductor device. The Z-height may be calculated at a coordinate in the X-direction and Y-direction.