The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Sep. 24, 2024
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Pradeep Vukkadala, Santa Clara, CA (US);

Cao Zhang, Ann Arbor, MI (US);

Anatoly Burov, Austin, TX (US);

Guy Parsey, Ann Arbor, MI (US);

Kyeongeun Ko, Gyeonggi-do, KR;

Sergei G. Bakarian, Mountain View, CA (US);

Janez Krek, Milan, MI (US);

Kunlun Bai, Campbell, CA (US);

Craig Higgins, Cedar Park, CA (US);

John S. Graves, Austin, TX (US);

Mark D. Smith, San Jose, CA (US);

John J. Biafore, North Scituate, RI (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 7/0006 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30164 (2013.01); G06T 2207/30242 (2013.01);
Abstract

Using an initial probability of occurrence of a stochastic defect over an inspection area of a workpiece, one or more defects within the inspection area are imaged using an optical tool or an electron beam tool. A probability of occurrence of a stochastic defect at each of the defect locations is generated using the model. The defect locations are grouped into probability bins. A consistency between the initial probability and observed results is determined and the model can be tuned based on the consistency.


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