Milan, MI, United States of America

Janez Krek

This inventor holds 3 USPTO granted patents. Top assignee: Kla Corporation. Active years: 2026.


% Patents Active = 66.7

Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Janez Krek

Introduction

Janez Krek is a notable inventor based in Milan, MI (US). He has made significant contributions to the field of lithography, particularly in the calibration and control of stochastic defects. With a total of 3 patents to his name, Krek's work is instrumental in advancing technology in this area.

Latest Patents

Krek's latest patents include a method to calibrate, predict, and control stochastic defects in EUV lithography. This method involves receiving an initial probability of occurrence of a stochastic defect over an inspection area of a workpiece. The locations of these defects are sorted by their initial probability of occurrence. A cumulative expected defect count is determined and normalized to be a fraction of the total expected defect count. Additionally, a number of defect locations is identified to capture potential stochastic defects above a threshold of total stochastic defects. Another patent focuses on imaging one or more defects within the inspection area using an optical tool or an electron beam tool. This process generates a probability of occurrence of a stochastic defect at each defect location, allowing for the grouping of defect locations into probability bins. The consistency between the initial probability and observed results is assessed, enabling the model to be fine-tuned based on this consistency.

Career Highlights

Janez Krek is currently employed at Kla Corporation, where he continues to innovate and develop new methods in lithography. His expertise in the field has positioned him as a key player in advancing technologies that enhance the efficiency and accuracy of lithographic processes.

Collaborations

Krek has collaborated with notable colleagues such as John J Biafore and Kyeongeun Ko. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Janez Krek's contributions to the field of lithography through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of technology in this critical area.

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