Petaluma, CA, United States of America

Alferd Cofer



Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 143(Granted Patents)


Company Filing History:


Years Active: 2000-2007

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14 patents (USPTO):Explore Patents

Title: Alferd Cofer: Innovator in Plasma Etching Technology

Introduction

Alferd Cofer, an inventive mind based in Petaluma, California, has made significant contributions to the field of semiconductor manufacturing. As an accomplished inventor, he holds a remarkable portfolio of 14 patents, focusing particularly on plasma etching technologies that enhance the capabilities and efficiency of semiconductor processing.

Latest Patents

Among his latest innovations are two noteworthy patents: the "Plasma Etch Reactor and Method" and "Method for Using a Hard Mask for Critical Dimension Growth Containment." The plasma etch reactor incorporates an upper electrode, lower electrode, and a peripheral ring electrode, strategically designed to improve the uniformity of process gases at the surface of a semiconductor wafer. This reactor enables greater control over the plasma densities by adjusting various power supplies.

The second patent introduces a method for utilizing a hard mask comprised of a reactive metal or an oxidized reactive metal to contain critical dimension growth on semiconductor substrates. This technique not only optimizes etching processes but also ensures better results through the use of materials that exhibit low sputter yield and reactivity with etch chemistries.

Career Highlights

Alferd's career has been highlighted by significant roles at reputable firms including Tegal Corporation and Silicon Valley Bank. His work in these organizations has allowed him to push the boundaries of innovation in the semiconductor industry, contributing to enhanced manufacturing processes and the development of cutting-edge technology.

Collaborations

Throughout his career, Alferd has collaborated with esteemed professionals such as Stephen P. DeOrnellas and Leslie G. Jerde. These partnerships have played a critical role in refining his inventions and paving the way for impactful developments in the field of semiconductor etching.

Conclusion

In summary, Alferd Cofer exemplifies the spirit of innovation within the semiconductor industry. His 14 patents, especially in plasma etching technologies, highlight his commitment to advancing semiconductor manufacturing. Through collaboration and a relentless pursuit of improvement, Alferd continues to influence the technological landscape, ensuring better outcomes in semiconductor applications for years to come.

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