The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2000
Filed:
Nov. 01, 1996
Applicant:
Inventors:
Stephen P DeOrnellas, Santa Rosa, CA (US);
Alferd Cofer, Petaluma, CA (US);
Paritosh Rajora, Petaluma, CA (US);
Assignee:
Tegal Corporation, Petaluma, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438714 ; 438711 ; 438713 ; 438720 ; 438734 ; 216 71 ; 156345 ;
Abstract
A method and apparatus provide for etching a semiconductor wafer using a two step physical etching and a chemical etching process in order to create vertical sidewalls required for high density DRAMs and FRAMs.
DeOrnellas, Stephen. (2000). Method and apparatus for etching a semiconductor wafer with features (U.S. Patent No. 6127277). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6127277
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile