Location History:
- Chiba, JA (1977)
- Funabashi, JA (1976 - 1978)
- Asahikawa-shi, Hokkaido, JP (1999)
- Asahikawa-shi, Hokkaido JP (1999)
- Ayase, JP (2000)
- Ayase-shi, Kanagawa-ken, JP (2000)
- Chiba, JP (1979 - 2017)
Company Filing History:
3 out of 1,235 
3 out of 4 
2 out of 57 
Years Active: 1976-2017
Title: Akitoshi Yoshida: Innovator in Chemical Mechanical Polishing
Introduction
Akitoshi Yoshida is a prominent inventor based in Funabashi, Japan. He has made significant contributions to the field of chemical mechanical polishing, holding a total of 16 patents. His work focuses on developing innovative polishing compositions and processes that enhance the efficiency and effectiveness of semiconductor substrate polishing.
Latest Patents
Yoshida's latest patents include a chemical mechanical polishing composition and process aimed at reducing scratches during the polishing of semiconductor substrates. This polishing slurry composition effectively minimizes the occurrence of scratches while ensuring an economical polishing step. The composition includes a metal oxide particle, at least one water-soluble organic polymer, and water. The method involves polishing a test substrate with a metal film or dielectric film by varying the rate of a polishing pad under constant pressure to achieve maximum polishing efficiency.
Another notable patent is related to a cerium oxide slurry and a method for manufacturing substrates. This invention addresses the challenge of flattening uneven films on substrates with precision and stability. By incorporating poly ammonium acrylates with varying degrees of neutralization as surfactants into the cerium oxide slurry, Yoshida has developed a solution that prevents separation into layers and maintains consistent viscosity.
Career Highlights
Throughout his career, Akitoshi Yoshida has worked with notable companies, including Nissan Chemical Industries Limited. His expertise in chemical mechanical polishing has positioned him as a key figure in the industry, contributing to advancements in semiconductor manufacturing processes.
Collaborations
Yoshida has collaborated with esteemed colleagues such as Shigeki Inoue and Masaharu Kosaka. Their combined efforts have furthered the development of innovative polishing technologies.
Conclusion
Akitoshi Yoshida's contributions to the field of chemical mechanical polishing have significantly impacted semiconductor manufacturing. His innovative patents and collaborations highlight his dedication to advancing technology in this critical area.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.