Miyagi, Japan

Akitoshi Harada

This inventor holds 10 USPTO granted patents and 2 published patent applications and 2 EPO patents. Top assignee: Tokyo Electron Limited. Active years: 2006-2019.

USPTO Granted Patents = 10 

% Patents Active = 80.0


Average Co-Inventor Count = 1.9

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Yamanashi, JP (2006)
  • Nirasaki, JP (2006)
  • Hillsboro, OR (US) (2009)
  • Miyagi, JP (2015 - 2019)

Company Filing History:


Years Active: 2006-2019

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10 patents (USPTO):Explore Patents

Title: Akitoshi Harada: Innovator in Plasma Processing Technology

Introduction

Akitoshi Harada is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 10 patents. His innovative methods have advanced the efficiency and effectiveness of plasma processing in various applications.

Latest Patents

Among his latest patents, Harada has developed a method of controlling temperature in plasma processing apparatuses. This method involves performing a plasma process on an object placed on an electrostatic chuck, which has an adjustable temperature. The electrostatic chuck is initially set to a first temperature, which is then gradually lowered to a second temperature after the plasma process is completed. Additionally, he has created a plasma processing method that includes loading a substrate into a chamber for plasma execution, applying a high-frequency bias power, and electrostatically attracting the substrate using a DC voltage.

Career Highlights

Harada is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has been instrumental in enhancing plasma processing techniques, which are crucial for the production of advanced electronic components.

Collaborations

Throughout his career, Harada has collaborated with notable colleagues, including Ju-Chia Hsieh and Koichiro Inazawa. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the field.

Conclusion

Akitoshi Harada's contributions to plasma processing technology exemplify his dedication to innovation and excellence. His patents and collaborative efforts continue to shape the future of the industry.

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