Sagamihara, Japan

Akihiro Ishizuka


Average Co-Inventor Count = 3.4

ph-index = 10

Forward Citations = 218(Granted Patents)


Location History:

  • Atsugi, JP (2012 - 2014)
  • Kanagawa, JP (2009 - 2016)
  • Sagamihara, JP (2013 - 2018)

Company Filing History:


Years Active: 2009-2018

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25 patents (USPTO):

Title: The Innovations of Akihiro Ishizuka in Semiconductor Technologies

Introduction

Akihiro Ishizuka, based in Sagamihara, Japan, is a prominent figure in the field of semiconductor technology. With an impressive portfolio of 25 patents, he has significantly contributed to advancements in semiconductor devices and manufacturing methods. His work continues to influence the industry and drive innovation.

Latest Patents

Ishizuka's latest patents demonstrate his expertise in semiconductor manufacturing. One notable invention, titled "Semiconductor device and method for manufacturing thereof," details a method for creating an oxide semiconductor layer that aligns with the curved surface of a projecting structural body. This innovative approach allows for a more efficient manufacturing process that enhances device performance.

Another significant patent, "Semiconductor device and manufacturing method thereof," outlines a comprehensive manufacturing process. This method includes forming an oxide insulating layer, followed by plasma etching treatments that create a trench with curved lower corner portions. The oxide semiconductor film, along with the gate insulating layer and electrodes, showcases Ishizuka's commitment to improving semiconductor efficiency and functionality.

Career Highlights

Ishizuka's association with Semiconductor Energy Laboratory Co., Ltd. has been pivotal in his career. His role at the company allows him to collaborate with leading experts and innovators in the field, pushing the boundaries of semiconductor research. His contributions have not only advanced his personal career but have also significantly impacted the global semiconductor industry.

Collaborations

Collaboration is at the heart of Ishizuka's work. He has worked alongside esteemed colleagues such as Shinya Sasagawa and Atsuo Isobe. Together, they have explored new avenues for semiconductor advancements, fostering a culture of innovation and teamwork within their research projects.

Conclusion

Akihiro Ishizuka’s contributions to semiconductor technology reflect a deep commitment to innovation and excellence. His groundbreaking patents and collaborative efforts at Semiconductor Energy Laboratory Co., Ltd. pave the way for future advancements in the industry, ensuring that his work will continue to influence the landscape of semiconductor technology for years to come.

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