The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2015

Filed:

Apr. 13, 2012
Applicants:

Atsuo Isobe, Isehara, JP;

Toshinari Sasaki, Tochigi, JP;

Shinya Sasagawa, Chigasaki, JP;

Akihiro Ishizuka, Sagamihara, JP;

Inventors:

Atsuo Isobe, Isehara, JP;

Toshinari Sasaki, Tochigi, JP;

Shinya Sasagawa, Chigasaki, JP;

Akihiro Ishizuka, Sagamihara, JP;

Assignee:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 27/06 (2006.01); H01L 27/12 (2006.01); H01L 29/786 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0688 (2013.01); H01L 21/02554 (2013.01); H01L 21/02565 (2013.01); H01L 21/02667 (2013.01); H01L 27/1225 (2013.01); H01L 29/7869 (2013.01); H01L 29/78696 (2013.01); H01L 29/42384 (2013.01); H01L 29/78603 (2013.01); H01L 29/66969 (2013.01);
Abstract

An insulating layer is provided with a projecting structural body, and a channel formation region of an oxide semiconductor layer is provided in contact with the projecting structural body, whereby the channel formation region is extended in a three dimensional direction (a direction perpendicular to a substrate). Thus, it is possible to miniaturize a transistor and to extend an effective channel length of the transistor. Further, an upper end corner portion of the projecting structural body, where a top surface and a side surface of the projecting structural body intersect with each other, is curved, and the oxide semiconductor layer is formed to include a crystal having a c-axis perpendicular to the curved surface.


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