Akihiko Ohi

Title: Akihiko Ohi: Innovator in Semiconductor Technology

Introduction

Akihiko Ohi is a distinguished inventor located in Nagano, Japan, known for his remarkable contributions to semiconductor technology. With a total of seven patents to his name, Ohi has made significant advancements in the field, particularly in the development of MOS-driven semiconductor devices.

Latest Patents

His most recent patents include a comprehensive method for manufacturing a MOS-driven semiconductor device. This innovative approach involves forming a mask for an nsource layer using a nitride film on the substrate's surface before trench formation. This method ensures a sufficient width of the nsource layer, enabling stable contact with the source electrode. Ohi's patent describes a process where a CVD oxide film, acting as an interlayer insulating film with specified thickness parameters, is strategically applied on doped poly-silicon used as a gate electrode embedded in the trench. By preventing oxidation of the non-doped poly-silicon, he has effectively minimized the generation of voids in the CVD oxide film, streamlining semiconductor apparatus manufacturing.

Career Highlights

Throughout his career, Akihiko Ohi has been affiliated with renowned companies, including Fuji Electric Co., Ltd. and Fuji Electric Holdings Co., Ltd. His work at these organizations has facilitated the development of advanced semiconductor technologies, enhancing efficiency and reliability in electronic devices.

Collaborations

Ohi's journey in innovation has led him to collaborate with notable coworkers such as Kin-On Sin and Chun-Wai Ng. These partnerships have played a crucial role in pushing the boundaries of semiconductor technology and ensuring the successful implementation of innovative solutions.

Conclusion

In summary, Akihiko Ohi emerges as a pivotal figure in the semiconductor landscape, particularly with his innovative patents related to MOS-driven devices. His expertise and collaborative efforts continue to influence the field, paving the way for future advancements in semiconductor technologies. Ohi's contributions highlight the importance of innovation in creating efficient and sophisticated electronic devices.