Yokohama, Japan

Akifumi Ueda

This inventor holds 14 USPTO granted patents, primarily in Photosensitive Resins. Top assignees: Mitsubishi Rayon Company, Limited, Micro Process Inc., Everlight Chemical Industrial Corporation. Active years: 1994-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akifumi Ueda. Retrieved from https://idiyas.com/inventor/akifumi-ueda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 85.7

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Hiroshima, JP (1994)
  • Kanagawa, JP (2009 - 2013)
  • Toyohashi, JP (2014)
  • Yokohama, JP (2011 - 2015)
  • Tsukuba, JP (2017)

Company Filing History:


Years Active: 1994-2017

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Areas of Expertise:
Photosensitive Resin
Resist Polymer
Pattern Formation
Printed Circuit Board
Dry Film
Composition
Substrates
Recording Medium
Heat-Sensitive Transfer
Process Production
Dye Receptive Layer
14 patents (USPTO):Explore Patents

Title: Akifumi Ueda: Innovator in Photosensitive Resin Technology

Introduction

Akifumi Ueda is a prominent inventor based in Yokohama, Japan, known for his significant contributions to the field of photosensitive resin technology. With a total of 14 patents to his name, Ueda has made remarkable advancements that have impacted various industries, particularly in electronics and materials science.

Latest Patents

Ueda's latest patents include a photosensitive resin composition, a photosensitive dry film, and a pattern formation method for printed circuit boards. His innovative photosensitive resin composition contains a vinyl-based copolymer obtained by polymerizing a specific monomer mixture. This composition is designed to enhance the performance of printed circuit boards and improve the efficiency of the manufacturing process. Additionally, he has developed a resist polymer used in DUV excimer laser lithography, which incorporates various constituent units to optimize its functionality.

Career Highlights

Throughout his career, Ueda has worked with notable companies such as Mitsubishi Rayon Company, Limited and Micro Process Inc. His experience in these organizations has allowed him to refine his expertise in polymer chemistry and materials engineering, leading to the development of cutting-edge technologies.

Collaborations

Ueda has collaborated with talented individuals in his field, including Hikaru Momose and Atsushi Ootake. These partnerships have fostered a creative environment that has contributed to the success of his projects and innovations.

Conclusion

Akifumi Ueda's work in photosensitive resin technology exemplifies the spirit of innovation and dedication to advancing materials science. His contributions continue to influence the industry and inspire future inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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