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For the Inventor, By the Inventor

Yokohama, Japan

Akifumi Ueda

USPTO Granted Patents = 14

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Hiroshima, JP (1994)
  • Kanagawa, JP (2009 - 2013)
  • Toyohashi, JP (2014)
  • Yokohama, JP (2011 - 2015)
  • Tsukuba, JP (2017)

Company Filing History:

goldMedal13 out of 1,357 
 
Mitsubishi Rayon Company, Limited
 patents
silverMedal3 out of 4 
 
Micro Process Inc.
 patents
bronzeMedal2 out of 10 
 
Everlight Chemical Industrial Corporation
 patents
where one patent can have more than one assignee

Years Active: 1994-2017

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14 patents (USPTO):Explore Patents
1. 9625812 - Photosensitive resin composition, photosensitive dry film, pattern formation method, printed circuit board, and method for producing same (2017-04-18),
2. 9188857 - Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon (2015-11-17),
3. 8647807 - Photosensitive resin composition, photosensitive dry film and method for forming pattern (2014-02-11),
4. 8647806 - Photosensitive resin composition, photosensitive dry film and method for forming pattern (2014-02-11),
5. 8614283 - Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer (2013-12-24),
6. 8580481 - Resist polymer and resist composition (2013-11-12),
7. 8476401 - Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon (2013-07-02),
8. 8241829 - Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer (2012-08-14),
9. 8092979 - Resist polymer and resist composition (2012-01-10),
10. 8049042 - Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer (2011-11-01),
11. 7575846 - Resist polymer and resist composition (2009-08-18),
12. 5376500 - Polyester resin for a dye receptive layer of a recording medium for (1994-12-27),
13. 5326742 - Recording medium for sublimation type heat-sensitive transfer recording (1994-07-05),
14. 5326741 - Recording medium for sublimation type heat-sensitive transfer recording (1994-07-05),

Title: Akifumi Ueda: Innovator in Photosensitive Resin Technology

Introduction

Akifumi Ueda is a prominent inventor based in Yokohama, Japan, known for his significant contributions to the field of photosensitive resin technology. With a total of 14 patents to his name, Ueda has made remarkable advancements that have impacted various industries, particularly in electronics and materials science.

Latest Patents

Ueda's latest patents include a photosensitive resin composition, a photosensitive dry film, and a pattern formation method for printed circuit boards. His innovative photosensitive resin composition contains a vinyl-based copolymer obtained by polymerizing a specific monomer mixture. This composition is designed to enhance the performance of printed circuit boards and improve the efficiency of the manufacturing process. Additionally, he has developed a resist polymer used in DUV excimer laser lithography, which incorporates various constituent units to optimize its functionality.

Career Highlights

Throughout his career, Ueda has worked with notable companies such as Mitsubishi Rayon Company, Limited and Micro Process Inc. His experience in these organizations has allowed him to refine his expertise in polymer chemistry and materials engineering, leading to the development of cutting-edge technologies.

Collaborations

Ueda has collaborated with talented individuals in his field, including Hikaru Momose and Atsushi Ootake. These partnerships have fostered a creative environment that has contributed to the success of his projects and innovations.

Conclusion

Akifumi Ueda's work in photosensitive resin technology exemplifies the spirit of innovation and dedication to advancing materials science. His contributions continue to influence the industry and inspire future inventors.

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