The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
May. 22, 2013
Applicant:
Mitsubishi Rayon Co., Ltd., Minato-ku, JP;
Inventors:
Hikaru Momose, Yokohama, JP;
Akifumi Ueda, Yokohama, JP;
Assignee:
MITSUBISHI RAYON CO., LTD., Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 222/20 (2006.01); C08F 220/28 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C08F 220/28 (2013.01); C08F 222/20 (2013.01); G03F 7/0397 (2013.01); G03F 7/30 (2013.01); G03F 7/0046 (2013.01); G03F 7/2041 (2013.01);
Abstract
A resist polymer (Y'), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y′):