Location History:
- Hiroshima, JP (2005)
- Kanagawa, JP (2006 - 2013)
- Yokohama, JP (2011 - 2015)
Company Filing History:
Years Active: 2005-2015
Title: Innovator Hikaru Momose: Pioneering Advances in Resist Polymers
Introduction
Hikaru Momose, an accomplished inventor based in Kanagawa, Japan, has made significant contributions to the field of materials science. With a remarkable portfolio of 12 patents, Momose specializes in the development of resist polymers that have wide applications in lithography technologies.
Latest Patents
Hikaru Momose's latest inventions include a series of patents focused on resist polymers and their applications. One notable patent details a resist polymer (Y') designed for DUV excimer laser lithography and electron beam lithography. This innovative resist polymer comprises various structural units, including a lactone skeleton, an acid-eliminable group, a hydrophilic group, and specialized constituents that enhance its performance. His work ensures minimal line edge roughness and defect production, which is critical for precision pattern formation in advanced manufacturing processes.
Another groundbreaking patent involves a resist polymer combining acid-decomposable units that offer improved processing capabilities for pattern formation. This innovation is pivotal in achieving higher quality and reliability in resist applications for DUV excimer laser lithography, addressing common issues of defects and line edge roughness in the industry.
Career Highlights
Momose is currently affiliated with Mitsubishi Rayon Company, Limited, where he continues to drive innovations in polymer technology. His extensive work in resist polymers has positioned him as a leading figure in the development of materials that meet the rigorous demands of modern lithographic techniques.
Collaborations
Throughout his career, Hikaru Momose has collaborated with talented professionals, including Akifumi Ueda and Tadayuki Fujiwara. These collaborations have fostered a creative environment that encourages knowledge exchange and accelerates the development of cutting-edge resin technologies.
Conclusion
Hikaru Momose's dedication to advancing resist polymers through innovation has significantly impacted the field of lithography. His patents pave the way for improved manufacturing processes and exemplify the importance of scientific research in creating practical solutions for industry challenges. As he continues his work at Mitsubishi Rayon Company, Limited, the future will undoubtedly see further advancements from this remarkable inventor.