The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2006
Filed:
Dec. 05, 2001
Yoshihiro Kamon, Hiroshima, JP;
Tadayuki Fujiwara, Kanagawa, JP;
Hideaki Kuwano, Kanagawa, JP;
Hikaru Momose, Kanagawa, JP;
Atsushi Koizumi, Hiroshima, JP;
Yoshihiro Kamon, Hiroshima, JP;
Tadayuki Fujiwara, Kanagawa, JP;
Hideaki Kuwano, Kanagawa, JP;
Hikaru Momose, Kanagawa, JP;
Atsushi Koizumi, Hiroshima, JP;
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Abstract
A (meth)acrylate represented by the following formula (): wherein each of R, R, Rand Rrepresents a hydrogen atom, a methyl group or an ethyl group; either one of Xor Xrepresents a (meth)acryloyloxy group and the other represents a hydrogen atom; both Aand Arepresent hydrogen atoms, or Aand Aform —O—, —CH— or —CHCH—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.