The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Jul. 01, 2009
Hikaru Momose, Kanagawa, JP;
Atsushi Ootake, Kanagawa, JP;
Akifumi Ueda, Kanagawa, JP;
Tadayuki Fujiwara, Tokyo, JP;
Masaru Takeshita, Kanagawa, JP;
Ryotaro Hayashi, Kanagawa, JP;
Takeshi Iwai, Kanagawa, JP;
Hikaru Momose, Kanagawa, JP;
Atsushi Ootake, Kanagawa, JP;
Akifumi Ueda, Kanagawa, JP;
Tadayuki Fujiwara, Tokyo, JP;
Masaru Takeshita, Kanagawa, JP;
Ryotaro Hayashi, Kanagawa, JP;
Takeshi Iwai, Kanagawa, JP;
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Abstract
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.