Mitsubishi Rayon Company, Limited

Hikaru Momose

Akifumi Ueda

Tadayuki Fujiwara

Atsushi Ootake

Takeshi Iwai

Masaru Takeshita

Ryotaro Hayashi

Tadashi Nakamura

Yoshihiro Kamon

Hideaki Kuwano

Atsushi Koizumi

Naoshi Murata

Ryuichi Ansai

Toru Tokimitsu

Yukiya Wakisaka

A resist polymer (Y'), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y&#x2032;): 

Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon

To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.  In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n&#x2267;3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; Kand Keach represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; Land Leach represent at least one selected from &#x2014;C(O)O&#x2014;, &#x2014;C(O)&#x2014; and &#x2014;OC(O)&#x2014;; M, Mand Meach represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Yand Yeach represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and Rrepresents H or a methyl group.

Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer

The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Resist polymer and resist composition

A resist polymer (Y'), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by the following formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y&#x2032;): 

Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon

To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n&#x2267;3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; Kand Keach represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; Land Leach represent at least one selected from &#x2014;C(O)O&#x2014;, &#x2014;C(O)&#x2014; and &#x2014;OC(O)&#x2014;; M, Mand Meach represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Yand Yeach represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, m3 and n1 each represent 0 or 1; and Rrepresents H or a methyl group.

A (meth)acrylate represented by the following formula (1): 

(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern

A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein Rrepresents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; Rrepresents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or Rand Rrepresent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, and a carboxy group esterified with an alcohol containing 1 to 6 carbon atoms.

5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process

A (meth)acrylate represented by the following formula (): wherein each of R, R, Rand Rrepresents a hydrogen atom, a methyl group or an ethyl group; either one of Xor Xrepresents a (meth)acryloyloxy group and the other represents a hydrogen atom; both Aand Arepresent hydrogen atoms, or Aand Aform &#x2014;O&#x2014;, &#x2014;CH&#x2014; or &#x2014;CHCH&#x2014;, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.

(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns

A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II):

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Kanagawa, Japan

Hikaru Momose