The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Dec. 27, 2010
Akifumi Ueda, Toyohashi, JP;
Hidetaka Nakagawara, Toyohashi, JP;
Kazuo Watanabe, Koshigaya, JP;
Shigeki Watanabe, Koshigaya, JP;
Wei Jen Lan, Taoyuan Hsien, TW;
Chao Wen Lin, Taoyuan Hsien, TW;
Akifumi Ueda, Toyohashi, JP;
Hidetaka Nakagawara, Toyohashi, JP;
Kazuo Watanabe, Koshigaya, JP;
Shigeki Watanabe, Koshigaya, JP;
Wei Jen Lan, Taoyuan Hsien, TW;
Chao Wen Lin, Taoyuan Hsien, TW;
Micro Process Inc., Koshigaya-shi, JP;
Everlight Chemical Industrial Corporation, Taoyuan Hsien, TW;
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Abstract
A photosensitive resin composition comprising: a vinyl-based polymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group; a vinyl-based polymer (II) obtained by polymerizing a monomer mixture containing a carboxyl group-containing vinyl monomer (b), and having a weight average molecular weight of 20,000 to 100,000, provided that the vinyl-based polymer (I) is excluded; a quinonediazide compound (III); and a compound (IV) represented by following formula (5). [In the formula, Y is a hydrocarbon group of 1 to 6 carbon atoms; l and m are each independently an integer of 1 to 3; n is 1 or 2; p and q are each independently 0 or 1.].