Chao Wen Lin

Title: Chao Wen Lin: Innovator in Photosensitive Resin Technology

Introduction

Chao Wen Lin is a notable inventor based in Taoyuan Hsien, Taiwan. She has made significant contributions to the field of photosensitive resin compositions, with a focus on enhancing the quality and performance of resist films used in various applications.

Latest Patents

Chao Wen Lin holds 2 patents related to her innovative work. Her latest patents include a photosensitive resin composition and a photosensitive dry film, along with a method for forming patterns. The first patent describes a photosensitive resin composition that includes a vinyl-based copolymer obtained from a specific monomer mixture. This composition aims to suppress the occurrence of cracks and improve sensitivity and resolution in resist films. The second patent further elaborates on a photosensitive resin composition that combines different vinyl-based polymers and quinonediazide compounds, enhancing the overall performance of the resist film.

Career Highlights

Throughout her career, Chao Wen Lin has worked with prominent companies such as Micro Process Inc. and Everlight Chemical Industrial Corporation. Her experience in these organizations has allowed her to refine her expertise in the development of advanced materials for various industrial applications.

Collaborations

Chao has collaborated with notable professionals in her field, including Akifumi Ueda and Hidetaka Nakagawara. These collaborations have contributed to her innovative research and development efforts.

Conclusion

Chao Wen Lin's contributions to the field of photosensitive resin technology demonstrate her commitment to innovation and excellence. Her patents reflect her ability to address industry challenges and improve the performance of materials used in various applications.