Company Filing History:
2 out of 4 
2 out of 10 
2 out of 1,357 Years Active: 2014
Title: Wei Jen Lan: Innovator in Photosensitive Resin Technology
Introduction
Wei Jen Lan is a notable inventor based in Taoyuan Hsien, Taiwan. He has made significant contributions to the field of photosensitive resin compositions, which are essential in various applications, including electronics and photolithography.
Latest Patents
Wei Jen Lan holds two patents, with his latest inventions focusing on photosensitive resin compositions and methods for forming patterns. His first patent describes a photosensitive resin composition that includes a vinyl-based copolymer obtained from a specific monomer mixture. This composition aims to suppress the occurrence of cracks and enhance sensitivity and resolution in resist films. The second patent also involves a photosensitive resin composition, which comprises a vinyl-based polymer and a quinonediazide compound, designed to improve the quality and performance of photosensitive dry films.
Career Highlights
Throughout his career, Wei Jen Lan has worked with prominent companies such as Micro Process Inc. and Everlight Chemical Industrial Corporation. His experience in these organizations has allowed him to develop innovative solutions in the field of photosensitive materials.
Collaborations
Wei Jen Lan has collaborated with notable professionals in his field, including Akifumi Ueda and Hidetaka Nakagawara. These collaborations have contributed to the advancement of technology in photosensitive resin applications.
Conclusion
Wei Jen Lan's work in photosensitive resin technology showcases his innovative spirit and dedication to improving material performance. His patents reflect a commitment to advancing the field and addressing industry challenges.