The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Jul. 02, 2013
Micro Process Inc., Koshigaya-shi, JP;
Akifumi Ueda, Tsukuba, JP;
Hidetaka Nakagawara, Otake, JP;
Shintaro Okada, Toyohashi, JP;
Saki Fujita, Toyohashi, JP;
Kazuo Watanabe, Koshigaya, JP;
Shigeki Watanabe, Tokyo, JP;
MICRO PROCESS INC., Koshigaya-shi, JP;
Abstract
The photosensitive resin composition of the present invention contains a vinyl-based (co)polymer (I) obtained by polymerizing a monomer mixture (α) containing a vinyl-based monomer (a) having a phenolic hydroxyl group, a vinyl-based copolymer (II) having a weight-average molecular weight of 15,000 to 120,000, obtained by polymerizing a monomer mixture (β) containing a vinyl-based monomer (b) represented by CH═CRCOO(RO)R(wherein R=a hydrogen atom or a methyl group, R=a hydrocarbon group having a carbon number of 1 to 4, R=a hydrogen atom or a methyl group, and k=1 to 90) and a carboxyl group-containing vinyl-based monomer (c), a photosensitive substance (III), and a compound (IV) which is a specific aromatic polyhydroxy compound.