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Fremont, CA, United States of America

Veeco Ald Inc.

USPTO Granted Patents = 24

EPO Patents = 1

Forward Citations = 2,027

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11 inventors (with patents filed for the assignee):

Sang In Lee (24 out of 38 patents)

Samuel S Pak (6 out of 10 patents)

Daniel H Lee (5 out of 14 patents)

4. Hyoseok Daniel Yang (4 out of 4 patents)

5. Ilsong Lee (3 out of 3 patents)

6. Hyo Seok Yang (3 out of 3 patents)

7. Chang Wan Hwang (2 out of 2 patents)

8. Jeong Ah Yoon (1 out of 1 patent)

9. Suk Yal Cha (1 out of 1 patent)

10. Seung Yeop Baek (1 out of 1 patent)

11. Daniel Yang (1 out of 1 patent)

24 patents: Sort by Forward Citations

1. 9558963 - Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation (2017-01-31),

2. 9556514 - Spatial deposition of material using short-distance reciprocating motions (2017-01-31),

3. 9546423 - Cleaning of deposition device by injecting cleaning gas into deposition device (2017-01-17),

4. 9435030 - Radical reactor with inverted orientation (2016-09-06),

5. 9376455 - Molecular layer deposition using reduction process (2016-06-28),

6. 9177788 - Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation (2015-11-03),

7. 9163310 - Enhanced deposition of layer on substrate using radicals (2015-10-20),

8. 9145608 - Scanning injector assembly module for processing substrate (2015-09-29),

9. 9129913 - Formation of barrier layer on device using atomic layer deposition (2015-09-08),

10. D732093 - Gas tube assembly (2015-06-16),

11. D732092 - Gas injection plate (2015-06-16),

12. 9051637 - Securing of shadow mask and substrate on susceptor of deposition apparatus (2015-06-09),

13. 8895108 - Method for forming thin film using radicals generated by plasma (2014-11-25),

14. 8877300 - Atomic layer deposition using radicals of gas mixture (2014-11-04),

15. 8871628 - Electrode structure, device comprising the same and method for forming electrode structure (2014-10-28),

Veeco ALD Inc. is a leading global provider of Atomic Layer Deposition (ALD) solutions for advanced semiconductor, industrial, and research applications. With a focus on delivering precision and high-quality thin film solutions, Veeco ALD enables customers to achieve superior material performance and device reliability. Through continuous innovation and collaboration, Veeco ALD is at the forefront of shaping the future of ALD technology.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

24 Patents

#81 in Fremont, CA

#3,172 in California

#13,406 in US

#25,842 in the World

Fremont, CA, United States of America

Veeco Ald Inc.

Forward Citations = 2,027

11 inventors:

Sang In Lee (24 out of 38 patents)

Samuel S Pak (6 out of 10 patents)

Daniel H Lee (5 out of 14 patents)

4. Hyoseok Daniel Yang (4 out of 4 patents)

5. Ilsong Lee (3 out of 3 patents)

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