For the Inventor, By the Inventor

Enter assignee name

Fremont, CA, United States of America

Veeco Ald Inc.

USPTO Granted Patents = 24

% Expired Patents = 87.5

EPO Patents = 1

Forward Citations = 2,111

Loading Chart...

Loading Chart...

11 inventors (with patents filed for the assignee):

Sang In Lee (24 out of 39 patents)

Samuel S Pak (6 out of 10 patents)

Daniel H Lee (5 out of 15 patents)

4. Hyoseok Daniel Yang (4 out of 4 patents)

5. Ilsong Lee (3 out of 3 patents)

6. Hyo Seok Yang (3 out of 3 patents)

7. Chang Wan Hwang (2 out of 2 patents)

8. Jeong Ah Yoon (1 out of 1 patent)

9. Suk Yal Cha (1 out of 1 patent)

10. Seung Yeop Baek (1 out of 1 patent)

11. Daniel Yang (1 out of 1 patent)

24 patents: Sort by Forward Citations

1. 9558963 - Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation (2017-01-31),

2. 9556514 - Spatial deposition of material using short-distance reciprocating motions (2017-01-31),

3. 9546423 - Cleaning of deposition device by injecting cleaning gas into deposition device (2017-01-17),

4. 9435030 - Radical reactor with inverted orientation (2016-09-06),

5. 9376455 - Molecular layer deposition using reduction process (2016-06-28),

6. 9177788 - Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation (2015-11-03),

7. 9163310 - Enhanced deposition of layer on substrate using radicals (2015-10-20),

8. 9145608 - Scanning injector assembly module for processing substrate (2015-09-29),

9. 9129913 - Formation of barrier layer on device using atomic layer deposition (2015-09-08),

10. D732093 - Gas tube assembly (2015-06-16),

11. D732092 - Gas injection plate (2015-06-16),

12. 9051637 - Securing of shadow mask and substrate on susceptor of deposition apparatus (2015-06-09),

13. 8895108 - Method for forming thin film using radicals generated by plasma (2014-11-25),

14. 8877300 - Atomic layer deposition using radicals of gas mixture (2014-11-04),

15. 8871628 - Electrode structure, device comprising the same and method for forming electrode structure (2014-10-28),

Veeco Ald Inc., headquartered in Fremont, California, specializes in advanced manufacturing equipment and process solutions for the semiconductor and microelectronics industries. The company focuses on developing innovative technologies that enhance the performance and efficiency of electronic devices. With a commitment to research and development, Veeco Ald Inc. plays a crucial role in enabling cutting-edge applications in various sectors, including telecommunications, consumer electronics, and automotive technologies.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Sep 29 2026

24 Patents

#89 in Fremont, CA

#3,282 in California

#13,859 in US

#26,595 in the World

Fremont, CA, United States of America

Veeco Ald Inc.

Forward Citations = 2,111

11 inventors:

Sang In Lee (24 out of 39 patents)

Samuel S Pak (6 out of 10 patents)

Daniel H Lee (5 out of 15 patents)

4. Hyoseok Daniel Yang (4 out of 4 patents)

5. Ilsong Lee (3 out of 3 patents)

Please report any incorrect information to [email protected]

Loading…