Cupertino, CA, United States of America

Hyoseok Daniel Yang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2016)
  • Cupertino, CA (US) (2015 - 2017)

Company Filing History:


Years Active: 2015-2017

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4 patents (USPTO):Explore Patents

Title: Hyoseok Daniel Yang: Innovator in Deposition Technology

Introduction

Hyoseok Daniel Yang is a prominent inventor based in Cupertino, California. He has made significant contributions to the field of deposition technology, holding a total of four patents. His innovative work focuses on improving the efficiency and effectiveness of deposition devices.

Latest Patents

One of Yang's latest patents is titled "Cleaning of deposition device by injecting cleaning gas into deposition device." This invention relates to a deposition device that operates in two modes: a deposition mode and a cleaning mode. In the deposition mode, modular injectors inject materials onto a substrate to form a layer. In the cleaning mode, the deposition device is cleaned without disassembly by injecting a cleaning gas. The injector module assembly may be cleaned in the cleaning mode by injecting cleaning gas through an exhaust for removing reactant precursor and routing the cleaning gas from the exhaust to another exhaust for removing source precursor. Alternatively, the injector module assembly is cleaned by injecting cleaning gas into a passage between an injector for injecting a source precursor and another injector for injecting a reactant precursor, and routing the cleaning gas to one of the exhausts in the cleaning mode.

Another notable patent is the "Radical reactor with inverted orientation." This radical reactor includes an elongated structure received within a chamber of the body of the radical reactor. Radicals are generated within a radical chamber formed in the elongated structure by applying a voltage signal across the elongated structure and an electrode extending within the radical chamber. The radicals generated in the radical chamber are routed via a discharge port of the elongated structure and a conduit formed in the body of the radical reactor onto the substrate. The discharge port and the conduit are not aligned so that irradiation generated in the radical chamber is not directed to the substrate.

Career Highlights

Hyoseok Daniel Yang is currently employed at Veeco Instruments Inc., a company known for its advanced manufacturing equipment. His work at Veeco has allowed him to develop cutting-edge technologies that enhance the capabilities of deposition devices.

Collaborations

Yang has collaborated with notable colleagues, including Samuel S Pak and Sang In Lee, who have contributed to his innovative projects and research endeavors.

Conclusion

Hyoseok Daniel Yang is a distinguished inventor whose work in deposition technology has led to significant advancements in the field. His patents reflect a commitment to innovation and efficiency, making him a valuable asset to the industry

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