The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2017

Filed:

Jan. 23, 2015
Applicant:

Veeco Ald Inc., Fremont, CA (US);

Inventors:

Jeong Ah Yoon, Hwaseong-Si, KR;

Suk Yal Cha, San Jose, CA (US);

Seung Yeop Baek, Chungcheongnam-do, KR;

Daniel H. Lee, Burlingame, CA (US);

Samuel S. Pak, San Ramon, CA (US);

Daniel Yang, Cupertino, CA (US);

Sang In Lee, Los Altos Hills, CA (US);

Assignee:

Veeco ALD Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/54 (2006.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/04 (2013.01); C23C 16/45551 (2013.01); C23C 16/45578 (2013.01); C23C 16/545 (2013.01);
Abstract

Deposition of material is performed on a substrate by causing short-distance reciprocating motions of the substrate that improve uniformity of material on the substrate. A series of reactors for injecting material onto the substrate is arranged along the length of the substrate in a repeating manner. During each reciprocating motion, the susceptor moves a distance shorter than an entire length of the substrate. Portions of the substrate are injected with materials by a subset of reactors. Since the movement of the substrate is smaller, a linear deposition device including the susceptor may be made smaller.


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