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For the Inventor, By the Inventor

Hayward, CA, United States of America

Etec Systems, Inc.


USPTO Granted Patents = 61


Trademarks = 1

Forward Citations = 988

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63 inventors (with patents filed for the assignee):

goldMedal Lee H Veneklasen (14 out of 38 patents)

silverMedal Paul C Allen (11 out of 24 patents)

bronzeMedal Kim Yang Lee (7 out of 107 patents)

4.  Tai-Hon Philip Chang (7 out of 15 patents)

5.  Ho-Seob Kim (7 out of 9 patents)

6.  Marian Mankos (5 out of 51 patents)

7.  Robin Lynn Teitzel (5 out of 14 patents)

8.  Mark A Gesley (5 out of 13 patents)

9.  Stephen A Rishton (4 out of 10 patents)

10.  Timothy N Thomas (3 out of 29 patents)

11.  Lydia J Young (3 out of 14 patents)

12.  William J DeVore (3 out of 15 patents)

13.  Matthew J Jolley (3 out of 8 patents)

14.  Robert Innes (3 out of 7 patents)

15.  C Neil Berglund (3 out of 6 patents)


Core Competencies:
Lithography
Electron Beam
Microcolumn Assembly
Acousto-Optic Modulator
Charged Particle Beam
Laser Pattern Generation
Photoemission Source
Raster Scan
Precision Alignment
Masking Techniques
Magnetic Lens
Pattern Generation

61 patents:

1. 6331711 - Correction for systematic, low spatial frequency critical dimension variations in lithography (2001-12-18),
2. 6326635 - Minimization of electron fogging in electron beam lithography (2001-12-04),
3. 6315450 - Diaphragm preload air bearing (2001-11-13),
4. 6300630 - Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping (2001-10-09),
5. 6297584 - Precision alignment of microcolumn tip to a micron-size extractor aperture (2001-10-02),
6. 6295157 - Thermally balanced acousto-optic modulator (2001-09-25),
7. 6288401 - Electrostatic alignment of a charged particle beam (2001-09-11),
8. 6281508 - Precision alignment and assembly of microlenses and microcolumns (2001-08-28),
9. 6279490 - Epicyclic stage (2001-08-28),
10. 6274290 - Raster scan gaussian beam writing strategy and method for pattern generation (2001-08-14),
11. 6271514 - Multi-beam scanner including a dove prism array (2001-08-07),
12. 6262429 - Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field (2001-07-17),
13. 6259106 - Apparatus and method for controlling a beam shape (2001-07-10),
14. 6258491 - Mask for high resolution optical lithography (2001-07-10),
15. 6246190 - Integrated electron gun and electronics module (2001-06-12),
Etec Systems, Inc. is a leading technology company specializing in providing innovative solutions for various industries. With a strong focus on research and development, Etec Systems offers cutting-edge products and services that empower businesses to enhance their productivity and competitiveness. Our team of skilled professionals is dedicated to delivering reliable solutions and exceptional customer service. Visit our website to learn more about our offerings and how we can help your business thrive.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 30 2025

61 Patents

#8 in Hayward, CA

#1,348 in California

#5,706 in US

#11,502 in the World

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Hayward, CA, United States of America

Etec Systems, Inc.

Forward Citations = 988

63 inventors:

goldMedal Lee H Veneklasen (14 out of 38 patents)

silverMedal Paul C Allen (11 out of 24 patents)

bronzeMedal Kim Yang Lee (7 out of 107 patents)

4.  Tai-Hon Philip Chang (7 out of 15 patents)

5.  Ho-Seob Kim (7 out of 9 patents)

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