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Hayward, CA, United States of America

Etec Systems, Inc.

USPTO Granted Patents = 63

CIPO Patents = 14

Trademarks = 1

Forward Citations = 1,002

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64 inventors (with patents filed for the assignee):

Lee H Veneklasen (14 out of 38 patents)

Paul C Allen (11 out of 24 patents)

Kim Yang Lee (7 out of 107 patents)

4. Tai-Hon Philip Chang (7 out of 15 patents)

5. Ho-Seob Kim (7 out of 9 patents)

6. Marian Mankos (5 out of 51 patents)

7. Robin Lynn Teitzel (5 out of 14 patents)

8. Mark A Gesley (5 out of 13 patents)

9. Stephen A Rishton (4 out of 10 patents)

10. Timothy N Thomas (3 out of 29 patents)

11. Lydia J Young (3 out of 14 patents)

12. William J DeVore (3 out of 15 patents)

13. Matthew J Jolley (3 out of 8 patents)

14. Robert Innes (3 out of 7 patents)

15. C Neil Berglund (3 out of 6 patents)

Core Competencies:

Lithography

Electron Beam

Microcolumn Assembly

Acousto-Optic Modulator

Charged Particle Beam

Laser Pattern Generation

Photoemission Source

Raster Scan

Precision Alignment

Masking Techniques

Magnetic Lens

Pattern Generation

63 patents: Sort by Forward Citations

1. 6331711 - Correction for systematic, low spatial frequency critical dimension variations in lithography (2001-12-18),

2. 6326635 - Minimization of electron fogging in electron beam lithography (2001-12-04),

3. 6315450 - Diaphragm preload air bearing (2001-11-13),

4. 6300630 - Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping (2001-10-09),

5. 6297584 - Precision alignment of microcolumn tip to a micron-size extractor aperture (2001-10-02),

6. 6295157 - Thermally balanced acousto-optic modulator (2001-09-25),

7. 6288401 - Electrostatic alignment of a charged particle beam (2001-09-11),

8. 6281508 - Precision alignment and assembly of microlenses and microcolumns (2001-08-28),

9. 6279490 - Epicyclic stage (2001-08-28),

10. 6274290 - Raster scan gaussian beam writing strategy and method for pattern generation (2001-08-14),

11. 6271514 - Multi-beam scanner including a dove prism array (2001-08-07),

12. 6262429 - Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field (2001-07-17),

13. 6259106 - Apparatus and method for controlling a beam shape (2001-07-10),

14. 6258491 - Mask for high resolution optical lithography (2001-07-10),

15. 6246190 - Integrated electron gun and electronics module (2001-06-12),

Etec Systems, Inc. is a leading technology company specializing in providing innovative solutions for various industries. With a strong focus on research and development, Etec Systems offers cutting-edge products and services that empower businesses to enhance their productivity and competitiveness. Our team of skilled professionals is dedicated to delivering reliable solutions and exceptional customer service. Visit our website to learn more about our offerings and how we can help your business thrive.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Jan 13 2026

63 Patents

#8 in Hayward, CA

#1,317 in California

#5,582 in US

#11,346 in the World

Hayward, CA, United States of America

Etec Systems, Inc.

Forward Citations = 1,002

64 inventors:

Lee H Veneklasen (14 out of 38 patents)

Paul C Allen (11 out of 24 patents)

Kim Yang Lee (7 out of 107 patents)

4. Tai-Hon Philip Chang (7 out of 15 patents)

5. Ho-Seob Kim (7 out of 9 patents)

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