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Hayward, CA, United States of America

Etec Systems, Inc.

USPTO Granted Patents = 63

CIPO Patents = 14

Forward Citations = 1,011

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64 inventors (with patents filed for the assignee):

Lee H Veneklasen (14 out of 38 patents)

Paul C Allen (11 out of 24 patents)

Kim Yang Lee (7 out of 109 patents)

4. Tai-Hon Philip Chang (7 out of 15 patents)

5. Ho-Seob Kim (7 out of 9 patents)

6. Marian Mankos (5 out of 51 patents)

7. Robin Lynn Teitzel (5 out of 14 patents)

8. Mark A Gesley (5 out of 13 patents)

9. Stephen A Rishton (4 out of 10 patents)

10. Timothy N Thomas (3 out of 31 patents)

11. Lydia J Young (3 out of 14 patents)

12. William J DeVore (3 out of 15 patents)

13. Matthew J Jolley (3 out of 8 patents)

14. Robert Innes (3 out of 7 patents)

15. C Neil Berglund (3 out of 6 patents)

Core Competencies:

Electron Beam

Lithography

Precision Alignment

Microcolumn

Photoresist

Beam Blanker

Pattern Generation

Acousto-Optic Modulator

Thermal Management

Laser Scanner

Magnetic Deflection

63 patents: Sort by Forward Citations

1. 6331711 - Correction for systematic, low spatial frequency critical dimension variations in lithography (2001-12-18),

2. 6326635 - Minimization of electron fogging in electron beam lithography (2001-12-04),

3. 6315450 - Diaphragm preload air bearing (2001-11-13),

4. 6300630 - Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping (2001-10-09),

5. 6297584 - Precision alignment of microcolumn tip to a micron-size extractor aperture (2001-10-02),

6. 6295157 - Thermally balanced acousto-optic modulator (2001-09-25),

7. 6288401 - Electrostatic alignment of a charged particle beam (2001-09-11),

8. 6281508 - Precision alignment and assembly of microlenses and microcolumns (2001-08-28),

9. 6279490 - Epicyclic stage (2001-08-28),

10. 6274290 - Raster scan gaussian beam writing strategy and method for pattern generation (2001-08-14),

11. 6271514 - Multi-beam scanner including a dove prism array (2001-08-07),

12. 6262429 - Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field (2001-07-17),

13. 6259106 - Apparatus and method for controlling a beam shape (2001-07-10),

14. 6258491 - Mask for high resolution optical lithography (2001-07-10),

15. 6246190 - Integrated electron gun and electronics module (2001-06-12),

Company Overview

Etec Systems, Inc., based in Hayward, California, specializes in advanced electron beam lithography systems. The company focuses on precision alignment and pattern generation technologies essential for microfabrication processes. Etec's innovations include microcolumn designs and beam blanker systems, which enhance the capabilities of lithography applications. Their expertise in photoresist materials and acousto-optic modulators positions them as a key player in the semiconductor and nanotechnology sectors, driving advancements in high-resolution patterning techniques.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

63 Patents

#7 in Hayward, CA

#1,345 in California

#5,760 in US

#11,627 in the World

Hayward, CA, United States of America

Etec Systems, Inc.

Forward Citations = 1,011

64 inventors:

Lee H Veneklasen (14 out of 38 patents)

Paul C Allen (11 out of 24 patents)

Kim Yang Lee (7 out of 109 patents)

4. Tai-Hon Philip Chang (7 out of 15 patents)

5. Ho-Seob Kim (7 out of 9 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Etec Systems, Inc.. Retrieved from https://idiyas.com/company/etec-systems

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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