Location History:
- Berkeley, CA (US) (1998 - 2001)
- Richmond, CA (US) (2001 - 2002)
- The Sea Ranch, CA (US) (2004)
Company Filing History:
Years Active: 1998-2004
Title: Innovations of Robert Innes in Lithography Technology
Introduction
Robert Innes is a notable inventor based in Richmond, CA (US), recognized for his contributions to the field of lithography technology. He holds a total of 7 patents, showcasing his innovative approach to solving complex problems in electron beam lithography.
Latest Patents
Among his latest patents, Innes has developed methods for real-time prediction and correction of proximity resist heating in raster scan particle beam lithography. His first patent focuses on predicting proximity heating of resists in electron beam lithography in real-time, allowing for beam compensation during the writing process. This method utilizes a precomputed kernel for proximity resist temperature evaluation, ensuring accuracy in the calculations.
Another significant patent addresses the real-time correction of resist heating during energy beam lithography. This invention involves determining resist temperature and adjusting process parameters to mitigate increased resist sensitivity due to heating. Innes describes a linear superposition approximation that estimates resist temperature based on previously written points, enhancing the efficiency of the writing process. The iterative methods he developed can be implemented digitally or through specific analogue circuitry, leading to rapid calculations of resist heating. These innovations help prevent pattern blooming, ensuring precision in lithographic applications.
Career Highlights
Throughout his career, Robert Innes has worked with prominent companies such as Applied Materials, Inc. and Etec Systems, Inc. His experience in these organizations has contributed to his expertise in lithography technology and innovation.
Collaborations
Innes has collaborated with notable professionals in the field, including Sergey Babin and Lee H Veneklasen. These partnerships have further enriched his work and contributed to advancements in lithography.
Conclusion
Robert Innes is a distinguished inventor whose work in lithography technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to enhancing the efficiency and precision of electron beam lithography.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.