Location History:
- Hillsboro, OR (US) (1989 - 1999)
- Beaverton, OR (US) (1995 - 2004)
- Portland, OR (US) (2006)
Company Filing History:
3 out of 61 
3 out of 13,713 
2 out of 29 
Years Active: 1989-2006
Title: **Innovative Contributions of Matthew J Jolley in Semiconductor Fabrication**
Introduction
Matthew J Jolley, an accomplished inventor based in Beaverton, Oregon, has made significant contributions to the field of semiconductor fabrication. With a total of eight patents to his name, he has focused his research and innovations primarily on enhancing lithography techniques for microelectronic device patterns during integrated circuit fabrication.
Latest Patents
Among his latest innovations, Jolley's patents detail advanced systems and methods for gray scale lithography, particularly for defining edges in semiconductor manufacturing. One notable invention involves a method for critical dimension edge placement and slope enhancement utilizing central pixel dose addition or modulated inner pixels. This method identifies a center pixel of a feature and exposes it with additional doses to accurately place the edge of the feature. Another innovation highlights a strategy for improving edge resolution and critical dimension linearity in lithography, utilizing non-linear, non-monotonic intensities to optimize critical dimension characteristics in semiconductor fabrication processes.
Career Highlights
Jolley has held positions at prominent companies throughout his career, including Etec Systems, Inc. and Applied Materials, Inc. His expertise in the field has not only led to the development of innovative patents but has also established him as a key player in advancing semiconductor technologies.
Collaborations
Throughout his career, Jolley has collaborated with esteemed colleagues such as Robin Lynn Teitzel and John L Wipfli. These partnerships have further enriched his inventive journey, contributing to the evolution of cutting-edge lithography techniques.
Conclusion
Matthew J Jolley's contributions to semiconductor fabrication through his inventive spirit and dedication to research reflect the continuous advancements in the field. His patents provide essential methods for enhancing lithography processes, impacting the future of microelectronics and integrated circuit fabrication.